Technology | 2010.02.18
SEMATECH to Show Advances in EUV Lithography at SPIE 2010
ALBANY, N.Y. & AUSTIN, Texas--(BUSINESS WIRE)--Critical issues and potential solutions in preparing extreme ultraviolet lithography (EUVL) for high-volume manufacturing will be explored by SEMATECH technologists at the SPIE Advanced Lithography 2010 conferences Feb. 21-25 in San Jose, CA. The SEMATECH Lithography Program is based at the College of Nanoscale Science and Engineering’s (CNSE) Albany NanoTech Complex. “SEMATECH has had an extraordinary year in lithography, and we plan to
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