Technology | 2009.11.30
Applied Materials Releases the Industry’s Most Advanced, Productive CMP Platform – the Reflexion GT
TOKYO--(BUSINESS WIRE)--Applied Materials, Inc. today raised CMP* technology to a new level while lowering system cost of ownership (CoO) with the launch of its Applied Reflexion® GT system for advanced metal CMP applications. The system’s novel, dual-wafer design sets new benchmarks in CMP performance and productivity, delivering superior profile control and 60% higher throughput than competing systems. The Reflexion GT also dramatically cuts consumables cost, requiring up to 30% les
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